Mike Rosa is chief marketing officer (CMO) and senior vice president responsible for strategy at Onto Innovation. Prior to his current role, Mike served as CMO for Applied Materials ICAPS and Advanced Packaging Groups, where he was responsible for leadership of strategic and technical marketing, marketing communications, charting device segment inflection roadmaps and providing strategic business development support toward M&A activities. He has over 25 years’ experience in semiconductor engineering and technology, with roles that span device design and fabrication, equipment development, marketing and sales. His technical qualifications include B.Eng. (Hons) and Ph.D. degrees in Microelectronic Engineering and an MBA with dual majors in Marketing and Business Strategy. Mike has authored over 40 journal and conference publications and holds over 29 U.S. patents.
Meeting Challenges in MEMS with Advanced Metrology and Inspection Capabilities
Today, MEMS devices while continuing to maintain their novelty are for the most part no longer a new class of device technology – in fact the highest volume MEMS products IMUs, BAW/SAW filters, Microphones, Pressure Sensors, and Ink Jet devices are from a market entry perspective, considered mature. Despite this, they’re tirelessly evolving and continuing to bring new materials and unit process challenges. With each new design that leverages new materials or combinations of materials, together with increasingly challenging unit processes, the sophistication of the required metrology and inspection steps increases. This brief presentation will address a few of those challenges and explain the value that novel inspection and metrology capabilities can bring to both device manufacturers and equipment OEMs in characterizing their high-volume manufacturing processes and/or process development cycles. In doing so, optical critical dimension (OCD), infra-red (IR) inspection and acoustic metrology technologies will be highlighted in the context of IMU, Microphone, Piezo and finally bulk acoustic wave (BAW) filter device fabrication.
Onto Innovation is a leader in process control, combining global scale with an expanded portfolio of leading-edge technologies that include: Un-patterned wafer quality; 3D metrology spanning chip features from nanometer scale transistors to large die interconnects; macro defect inspection of wafers and packages; metal interconnect composition; factory analytics; and lithography for advanced semiconductor packaging. Our breadth of offerings across the entire semiconductor value chain combined with our connected thinking approach results in a unique perspective to help solve our customers’ most difficult yield, device performance, quality, and reliability issues. Onto Innovation strives to optimize customers’ critical path of progress by making them smarter, faster and more efficient. With headquarters and manufacturing in the U.S., Onto Innovation supports customers with a worldwide sales and service organization. Additional information can be found at www.ontoinnovation.com.
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